June 17, 2010

Beneq and ALD NanoSolutions form collaboration for Particle ALDTM

14.6.2010

Beneq, leading provider of new industrial equipment and technology based on atomic layer deposition (ALD) equipment, and ALD NanoSolutions, renowned developer of ALD processes and applications, including proprietary Particle ALDTM and Polymer ALDTM, have today signed a letter of intent (LOI) for future collaboration.

http://www.beneq.com/news39.php